Title:
METHOD FOR CORRECTING DISTORTION AND CHARGED BEAM ALIGNER
Document Type and Number:
Japanese Patent JPH11121354
Kind Code:
A
Abstract:
To improve throughput while keeping high overlay accuracy.
A method is used to estimate the distortion of a first pattern according to the measured value of the distortion obtained in advance by an optical aligner, when the second pattern is written by electron beam so that it is aligned with the first pattern formed on a wafer through exposing of the optical aligner. In this case, the measured value of distortion represents the measuring point of distortion and the correction quantity of deflection of electron beam shot at the exposure point therearound.
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Inventors:
ONO HARUTO
Application Number:
JP29181497A
Publication Date:
April 30, 1999
Filing Date:
October 09, 1997
Export Citation:
Assignee:
CANON KK
International Classes:
G03F7/20; H01J37/305; H01L21/027; (IPC1-7): H01L21/027; G03F7/20; H01J37/305
Attorney, Agent or Firm:
Tetsuya Ito (2 outside)