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Title:
透明基板上に成膜された反射防止処理を硬化させる方法、および硬化された反射防止処理を含む透明基板
Document Type and Number:
Japanese Patent JP7112496
Kind Code:
B2
Abstract:
A method hardens an anti-reflection treatment deposited on a transparent substrate that includes a top surface and a bottom surface which extends remotely from the top surface. The anti-reflection treatment includes depositing at least one anti-reflection layer of at least one material on at least one of the top and bottom surfaces of the transparent substrate, bombarding the at least one top or bottom surface on which the at least one anti-reflection layer has been deposited using a singly-charged and/or multi-charged ion beam produced by a singly-charged and/or multi-charged ECR electron cyclotron resonance ion source. The method produces a transparent substrate having undergone an anti-reflection treatment such that at least one of the top and bottom surfaces of the transparent substrate is coated with at least one anti-reflection layer of at least one material, whereby ions are implanted in the at least one anti-reflection layer.

Inventors:
Boulmé, Alexi
Meyer, Julian
Veuille, Pieri
Application Number:
JP2020535983A
Publication Date:
August 03, 2022
Filing Date:
September 19, 2019
Export Citation:
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Assignee:
Coma Deal S.A.
International Classes:
G02B1/11; C23C14/24; C23C14/48; H01J27/18; H01J37/08; H01J37/317
Domestic Patent References:
JP6138304A
JP2009204404A
JP2007233333A
JP2000021597A
JP2009271439A
JP2004170757A
JP2009242892A
Foreign References:
CH713040B
WO2015176850A1
WO2013183457A1
Attorney, Agent or Firm:
Shigeki Yamakawa
Masaki Yamakawa