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Title:
METHOD OF DEPOSITING
Document Type and Number:
Japanese Patent JP2006120714
Kind Code:
A
Abstract:

To provide a method of stably depositing which stably supplies a material to be supplied on the substrate to be processed on the substrate to be processed in the method of depositing using a medium of a supercritical state.

The method of depositing the treatment medium which adds a precursor to the medium of the supercritical state on the substrate to be processed includes a step of adding the precursor to the medium of the super-critical state in the state that it dissolved in an organic solvent.


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Inventors:
NARISHIMA MASAKI
MATSUZAWA OKIAKI
KOMIYA TAKAYUKI
KONDO HIDEKAZU
Application Number:
JP2004304537A
Publication Date:
May 11, 2006
Filing Date:
October 19, 2004
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
KONDO HIDEKAZU
International Classes:
H01L21/288; C23C16/455; H01L21/3205; H01L21/768
Domestic Patent References:
JP2007510054A2007-04-19
JP2004228526A2004-08-12
JP2003213425A2003-07-30
JP2003514115A2003-04-15
JP2004002752A2004-01-08
JP2003016857A2003-01-17
Attorney, Agent or Firm:
Tadahiko Ito



 
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