METHOD FOR DESIGNING OVERLAY MARK - ACCENT OPTICAL TECH INC

Title:

METHOD FOR DESIGNING OVERLAY MARK

Document Type and Number:

Japanese Patent JP2006157023

Kind Code:

A

Abstract:

To provide a scatterometry system having a high sensitivity and providing a precision to improve the overlay measurement.

A method for designing an overlay target grating used in the scatterometry measurement comprises (A) selecting a sample layer parameter, (B) selecting a first target grating having a first target property, (C) averaging standard deviations of overlay offset changes of the first target property over the angular range of an incidence light, and calculating an ASD (average standard deviation) of a reflected light at a mathematically modeled target, (D) shifting the first target grating property by a first increment, (E) repeating from step C, (F) comparing the ASDs of step C and step E, and setting the larger one as a new starting grating property, (G) repeating steps C to F till a desired maximum ASD is obtained, and (H) designing a real target so as to have a target grating property corresponding to the above ASD.

Inventors:

SMITH NIGEL PETER
KO CHUN-HUNG
KU YI-SHA
WANG SHIH CHUN

Application Number:

JP2005346110A

Publication Date:

June 15, 2006

Filing Date:

November 30, 2005

Export Citation:

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Assignee:

ACCENT OPTICAL TECH INC
IND TECH RES INST

International Classes:

H01L21/027; G01B11/02; G03F1/42; G03F1/68; G03F9/00; H01L21/66

Domestic Patent References:

JP2004077550A

2004-03-11

Foreign References:

WO2004076963A2	2004-09-10
US6819426B2	2004-11-16
US20030190793A1	2003-10-09

Attorney, Agent or Firm:

Osamu Kawamiya
Masahiro Ishino
Kazuhisa Inaba

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