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Patent Searching and Data


Title:
METHOD AND DEVICE FOR CONTINUOUSLY ETCHING ONE SIDE
Document Type and Number:
Japanese Patent JPH0254782
Kind Code:
A
Abstract:

PURPOSE: To evenly and continuously etch one side of a plate material with high productive efficiency by eccentrically rotating the plate material with the surface to be etched directed downward, continuously moving the material, and injecting a liq. etchant onto the surface from the lower part.

CONSTITUTION: A series of plate materials 1 having the shape of a circle, a square, etc., are freely detachably fixed to the plates 2. The plate 2 is eccentrically fixed to the rotating shaft 3 having a gear 6, and the rotating shaft 3 is fixed freely rotatably to a conveyor means of an endless belt. The plate 2 is horizontally conveyed by the conveyor means, and the gear 6 is engaged with a rack 9 for stopping and moving the gear 6 and rotated around the rotating shaft 3. As a result, the plate material 1 is eccentrically rotated with the surface to be etched directed downward, and horizontally and continuously moved. A liq. etchant is injected onto the side to be etched of the moving plate material 1 from the lower part by a spray nozzle 5, and the one side is etched.


Inventors:
ONO YOSHIO
Application Number:
JP20464888A
Publication Date:
February 23, 1990
Filing Date:
August 19, 1988
Export Citation:
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Assignee:
KENSEIDO KAGAKU KOGYO KK
International Classes:
G03F7/30; C23F1/00; (IPC1-7): C23F1/00; G03F7/30
Attorney, Agent or Firm:
Yataro Sasai (1 person outside)