Title:
METHOD AND DEVICE FOR CONTROLLING GAS SYSTEM
Document Type and Number:
Japanese Patent JP3470218
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To control the temperature, pressure, etc., of gas according to respective states of flow rate load, etc., depending upon whether or not there is a flow of gas in use.
SOLUTION: Flow rate sensors 41 and 42 which are interposed in supply ducts 2a to 2d for supplying specific gas to a process chamber 6 and detect the flow rate load depending upon whether or not there is a flow of the gas and a CPU 40 which previously stores a control constant corresponding to the flow rate load depending upon whether or not there is the flow of the gas are provided. The flow rate sensors 41 and 42 and/or an isopropyl (IPA) supply pump 43 detects the said flow rate load and/or a flow of IPA to send their detection signals to the CPU 40 and according to the control signal from the CPU 40, a cartridge heater 14, internal cylinder and external cylinder heaters 25 and 26, and a warmth retaining heater 62 are controlled.
Inventors:
Mitsuaki Komino
Osamu Uchizawa
Yasuhiro Chiba
Osamu Uchizawa
Yasuhiro Chiba
Application Number:
JP21366798A
Publication Date:
November 25, 2003
Filing Date:
July 29, 1998
Export Citation:
Assignee:
東京エレクトロン株式会社
株式会社本山製作所
株式会社本山製作所
International Classes:
H01L21/302; G05B13/02; G05D11/16; G05D16/20; G05D23/00; G05D23/19; H01L21/205; H01L21/304; H01L21/3065; (IPC1-7): G05D23/00; G05B13/02; G05D11/16; G05D16/20; G05D23/19
Domestic Patent References:
| JP577035A | ||||
| JP5346806A | ||||
| JP239309A |
Attorney, Agent or Firm:
Kikuhiko Nakamoto