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Title:
METHOD AND DEVICE FOR FORMING SURFACE SUPERSTRUCTURE
Document Type and Number:
Japanese Patent JPH06170218
Kind Code:
A
Abstract:

PURPOSE: To improve the characteristic of a material by irradiating the surface of the solid material with a molecular beam which is variable in energy and thermally non-equilibrium and making the molecule or atom selectively adsorbed on a specified adsorption seat.

CONSTITUTION: Metallic Ba, for example, is introduced into a raw gas chamber 1, heated by a heater 4 to form vaporous Ba and mixed with gaseous He supplied from a high-pressure gas tank 2 in a dilution chamber 10. The gaseous mixture is injected into an irradiation chamber 11 from a nozzle hole 4 to irradiate a W sample 5. A monochromatic molecular beam or atomic beam is used in this way to vary the energy with high precision, and the molecule or atom is adsorbed on the adsorption seat having a desired activation energy. Accordingly, performance is improved in the various functional materials with the characteristic controlled by the surface structure.


Inventors:
YAMAMOTO YOSHIHIKO
KAJIYAMA HIROSHI
MIYAKE TATSUYA
Application Number:
JP32916092A
Publication Date:
June 21, 1994
Filing Date:
December 09, 1992
Export Citation:
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Assignee:
HITACHI LTD
International Classes:
B01J19/08; B01J23/80; C23C14/24; (IPC1-7): B01J19/08; B01J23/80; C23C14/24
Attorney, Agent or Firm:
Ogawa Katsuo