METHOD AND DEVICE FOR SUBSTRATE WASHING

Title:

METHOD AND DEVICE FOR SUBSTRATE WASHING

Document Type and Number:

Japanese Patent JP2004356517

Kind Code:

A

Abstract:

To provide a substrate washing device and a substrate washing method wherein a washed substrate is not contaminated again in a drying process.

The substrate washing device has a substrate holding mechanism 10 holding an outer circumferential part of a substrate and a rotating mechanism 20 which rotates the substrate holding mechanism 10. A substrate W held by the substrate holding mechanism 10 is washed by spraying washing liquid, and after washing, the substrate W is rotated and washing liquid sticking to it is spattered for drying. In the device, the surface shape of the part of a member constituting the device whereto the washing liquid is sticking is made a tilting surface or a curved surface so that liquid droplets easily flow down, or at least the surface of a part whereto the washing liquid is sticking is formed of a water-repellent material or coated with a water-repellent material.

Inventors:

NISHIOKA YUKIKO
ATO KOJI
YONEKURA RYOSUKE
ARIGA GIICHI

Application Number:

JP2003154642A

Publication Date:

December 16, 2004

Filing Date:

May 30, 2003

Export Citation:

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Assignee:

EBARA CORP

International Classes:

B08B7/00; H01L21/00; H01L21/304; (IPC1-7): H01L21/304

Attorney, Agent or Firm:

Takashi Kumagai
Yu Takagi

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