Title:
METHOD FOR DIMENSIONAL CONTROL OF RESIST PATTERN AND HEATING TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP3392725
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve the dimensional controllability of a chemical amplification type resist.
SOLUTION: This dimensional control method includes a stage of subjecting the chemical amplification type resist applied on a surface to BEP processing to induce reaction using the acid in the resist as a catalyst by heating a substrate on which prescribed patterns are exposed (step S1), an intensity distribution measuring stage for executing irradiation with light of the wavelength at which the chemical amplification type resist is not sensitized and scanning (step S2) and measuring the intensity distribution of the reflected light (step S3), a stage for detecting the size of at least either of the part where the reaction occurs and the unreacted part (step S4), a stage for comparing the detected size and the set size (step S5), a stage for returning to the step S2 when the detected size and the set size are different in the step S5 and a stage for ending the BEP processing when the detected size and the set size are equal in the step S5 (step S6).
Inventors:
Hideaki Sakurai
Akitoshi Kumagai
Iwao Higashikawa
Akitoshi Kumagai
Iwao Higashikawa
Application Number:
JP23488697A
Publication Date:
March 31, 2003
Filing Date:
August 29, 1997
Export Citation:
Assignee:
Toshiba Corporation
International Classes:
G03F7/039; G03F7/26; G03F7/38; H01L21/027; (IPC1-7): G03F7/26; G03F7/039; G03F7/38; H01L21/027
Domestic Patent References:
| JP6110215A | ||||
| JP620939A | ||||
| JP547653A |
Attorney, Agent or Firm:
Takehiko Suzue (6 outside)