METHOD FOR DRESSING POLISHING PAD - KONICA MINOLTA OPTO INC

Title:

METHOD FOR DRESSING POLISHING PAD

Document Type and Number:

Japanese Patent JP2007253294

Kind Code:

A

Abstract:

To provide a method for dressing a polishing pad, which efficiently dresses the polishing pad with a simple configuration.

The method for dressing the polishing pads 12, 22 stuck on the surface of a polishing plate comprises steps of: blush-cleaning for cleaning the polishing pads by bringing brushes 34 into contact with the polishing pads; and high pressure water cleaning for cleaning the polishing pads by jetting high pressure water 46, 47 on the polishing pads. After the polishing steps have been finished for the required number of times, either one of the blush-cleaning step and the high pressure water cleaning step is carried out. After the polishing steps further have been finished for the required number of times, the other of the blush-cleaning step and the high pressure water cleaning step is carried out.

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Inventors:

NAKATSUJI YUKITOSHI
SAEKI SHINICHI
SASAKI KENICHI
SAWADA HIROAKI

Application Number:

JP2006082884A

Publication Date:

October 04, 2007

Filing Date:

March 24, 2006

Export Citation:

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Assignee:

KONICA MINOLTA OPTO INC

International Classes:

B24B53/017; B24B53/02; H01L21/304

Domestic Patent References:

JPH11277403A	1999-10-12
JPH11333695A	1999-12-07

Attorney, Agent or Firm:

Kitahara Yasuhiro

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