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Patent Searching and Data


Title:
METHOD FOR EXPOSING PATTERN
Document Type and Number:
Japanese Patent JPH0878182
Kind Code:
A
Abstract:

PURPOSE: To prevent the adhesion of a foreign material such as fine dust left in a clean room to a metal plate or pattern mask, and the sparking by static electricity by using a static eliminating device mounted on a pattern exposing machine.

CONSTITUTION: A static eliminating device 1 generates and plus supplies ions of both plus and minus polarities, for example, by corona discharge. The device 1 is set on a pattern exposing machine so that the pattern exposing machine is situated within the area effectively covered with the supplied ions of both the plus and minus polarities, and the static electricity charged on the pattern exposing machine, a metal material 2, and pattern masks 3, 31 is eliminated by the corona discharge by the device 1. Thus, a foreign matter such as fine dust left in a clean room can be prevented from being attracted by and adhered to the material 2 or masks 3, 3' by the Coulomb force of the static electricity, and the sparkling when the charged static electricity is discharged can be prevented.


Inventors:
KUNO HISASHI
MAKINO SEIJI
MURATA TAKUMI
Application Number:
JP20993594A
Publication Date:
March 22, 1996
Filing Date:
September 02, 1994
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
C23F1/00; G03F7/20; H01L21/027; H01T23/00; H05F3/04; H05K3/06; (IPC1-7): H05F3/04; C23F1/00; G03F7/20; H01L21/027; H01T23/00; H05K3/06