Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD FOR FABRICATING SEMICONDUCTOR OPTICAL ELEMENT
Document Type and Number:
Japanese Patent JP2014089403
Kind Code:
A
Abstract:

To provide a method for fabricating a semiconductor optical element, capable of enhancing uniformity of contact openings to an arm waveguide in a Mach-Zehnder modulator.

A mask for fabricating a waveguide is formed on an epitaxial substrate including an alignment of a first cladding layer, a core layer, and a second cladding layer. For the mask formation, an insulation film mask is formed using photolithography and etching. A waveguide pattern of the Mach-Zehnder modulator is formed using a reticle with corrected trench width in exposure. An aspect for correcting the trench width on a 3-inch wafer, for example, includes using a reticle with trench width of 130 μm, a reticle with trench width of 114.1 μm, and a reticle with trench width of 99.1 μm for shots from wafer centre to radius of 0 mm, shots from wafer centre to radius of 19 mm, and shots from wafer centre to radius 27 mm, respectively.


Inventors:
KITAMURA TAKAMITSU
YAGI HIDEKI
Application Number:
JP2012240410A
Publication Date:
May 15, 2014
Filing Date:
October 31, 2012
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
SUMITOMO ELECTRIC INDUSTRIES
International Classes:
G02F1/025
Domestic Patent References:
JP2008010484A2008-01-17
JP2012069800A2012-04-05
JP2007324445A2007-12-13
JP2007194390A2007-08-02
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Ichira Kondo



 
Previous Patent: OPTICAL MEMBER POSITION DETECTOR, LENS DRIVING DEVICE INCLUDING THE SAME, AND LENS DEVICE

Next Patent: METHOD OF PATTERN FORMATION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST...