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Title:
ランタニド含有膜を形成する方法
Document Type and Number:
Japanese Patent JP7253490
Kind Code:
B2
Abstract:
Lanthanide-containing film forming compositions comprising Lanthanide precursors having the general formulae:wherein Ln is a Lanthanide; A is independently N, Si, B, P or O; each E is independently C, Si, B or P; m and n are independently 0, 1 or 2; m+n>1; each R is independently an H or a C1-C4 hydrocarbyl group; L is a −1 anionic ligand selected from the group consisting of NR′2, OR′, Cp, amidinate, β-diketonate, or keto-iminate, wherein R′ is an H or a C1-C4 hydrocarbon group; and L′ is NR″ or O, wherein R″ is an H or a C1-C4 hydrocarbon group. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Lanthanide-containing films on one or more substrates via vapor deposition processes.

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Inventors:
Satoshi Gatino
Daehyun Kim
Unte No
Jean-Marc Girard
Application Number:
JP2019530435A
Publication Date:
April 06, 2023
Filing Date:
December 14, 2017
Export Citation:
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Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C23C16/18; C07F5/00; C23C16/40; C23C16/455; H01L21/316; H01L21/318
Domestic Patent References:
JP2009529579A
JP3163088A
JP8059674A
Attorney, Agent or Firm:
Patent Attorney Corporation Kyosei International Patent Office



 
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