To provide a method for forming a negative pattern, in which a pattern excellent in the depth of focus (DOF), uniformity in a local pattern dimension and resolution can be formed even when a pattern having various features including a contact hole pattern is to be formed, and to provide a method for manufacturing an electronic device including the above pattern forming method, an electronic device, and an actinic ray-sensitive or radiation-sensitive resin composition.
The method for forming a negative pattern includes steps of (1) forming a film comprising an actinic ray-sensitive or radiation-sensitive resin composition, (2) exposing the film and (3) developing the exposed film by using a developing solution containing an organic solvent. The actinic ray-sensitive or radiation-sensitive resin composition comprises (G) a non-polymeric compound having a molecular weight of 500 or more and containing a nitrogen atom and either a fluorine atom or a silicon atom.
YAMAGUCHI SHUHEI
TAKAHASHI HIDETOMO
YAMAMOTO KEI
YOSHINO FUMIHIRO
| JP2011197587A | 2011-10-06 | |||
| JP2006098950A | 2006-04-13 | |||
| JP2006201711A | 2006-08-03 | |||
| JP2011141494A | 2011-07-21 |
| WO2011083872A1 | 2011-07-14 |
Takakura Shigeo
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Morisezo Iseki
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
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