Title:
METHOD FOR FORMING PHOTORESIST PATTERN, AND METHOD FOR MANUFACTURING DISPLAY PANEL
Document Type and Number:
Japanese Patent JP2008191668
Kind Code:
A
Abstract:
To provide a method for forming a photoresist pattern having a step portion by performing a light exposure process for each region a different number of times with a digital exposure unit, thereby reducing a manufacturing cost.
A method for forming a photoresist pattern includes forming a photoresist, and forming a photoresist pattern having a step portion by performing a light exposure process a different number of times according to a region. A method for manufacturing a display panel is also provided. Thus, a manufacturing cost can be reduced without the need of using an expensive mask in manufacturing a display device.
Inventors:
SHIN KYOUNG-JU
SEKI SHUNKYO
CHAI CHONG-CHUL
SEKI SHUNKYO
CHAI CHONG-CHUL
Application Number:
JP2008023991A
Publication Date:
August 21, 2008
Filing Date:
February 04, 2008
Export Citation:
Assignee:
SAMSUNG ELECTRONICS CO LTD
International Classes:
G03F7/20; G02F1/1337; G02F1/1339; G02F1/1368; G09F9/30; H01L21/027
Attorney, Agent or Firm:
Takahashi Hayashi & Partners