Title:
感放射線性樹脂組成物、オニウム塩化合物及びレジストパターンの形成方法
Document Type and Number:
Japanese Patent JP7100805
Kind Code:
B2
Abstract:
A radiation-sensitive resin composition includes a resin including a structural unit having an acid-dissociable group, an onium salt compound represented by formula (1), and a solvent.R1 is a hydrogen atom or a monovalent group provided that the monovalent group is not a fluoro group or a monovalent organic group containing a fluorine atom. X1 and X2 are each independently a single bond, —O—, —S— or —NR′— wherein R′ is a hydrogen atom or a monovalent hydrocarbon group. In a case where X1 is —NR′—, R2 is a monovalent organic group or a hydrogen atom. In a case where X2 is —NR′—, R3 is a monovalent organic group or a hydrogen atom. In a case where neither X1 nor X2 is —NR′—, R2 and R3 are each independently a monovalent organic group.
Inventors:
Kei Nishikori
Application Number:
JP2018554200A
Publication Date:
July 14, 2022
Filing Date:
November 29, 2017
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
G03F7/004; C07C309/17; C07C381/12; C07D307/12; C07D307/33; C07D317/24; C07D317/36; C07D333/46; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP10010715A |
Attorney, Agent or Firm:
Patent Business Corporation Unias International Patent Office