Title:
METHOD FOR FORMING SILICA-BASED COATING FILM AND COATING LIQUID
Document Type and Number:
Japanese Patent JP2009297626
Kind Code:
A
Abstract:
To provide a method which for increasing the efficiency of a method of producing a silica-based coating film by an inkjet coating method by improving a coating liquid so as to suppress generation of clogging in a discharge port.
The coating liquid includes 8-40 wt.% of a solid and a solvent as the balance. The solvent comprises an organic solvent having a boiling point of 130C or more and an aqueous acid solution. The solid contains a silicon oxide oligomer obtained by hydrolyzing and polycondensing a trialkoxysilane and a tetraalkoxysilane in the solvent containing the aqueous acid solution. The silicon oxide oligomer has a weight average molecular weight of 500-50,000 in terms of polystyrene.
Inventors:
KUMON SOICHI
SAIO TAKASHI
AKAMATSU YOSHINORI
SAIO TAKASHI
AKAMATSU YOSHINORI
Application Number:
JP2008153640A
Publication Date:
December 24, 2009
Filing Date:
June 12, 2008
Export Citation:
Assignee:
CENTRAL GLASS CO LTD
International Classes:
B05D7/24; C03C17/25; C09D1/00; C09D1/04; C09D183/02; C09D183/04; C09D183/06
Attorney, Agent or Firm:
Yoshiaki Hanada