METHOD FOR FORMING SILICA BASED HARDENED COATING FILM, LIQUID FOR IMPROVING SILICA BASED HARDENED COATING FILM, SILICA BASED HARDENED COATING FILM AND ELECTRONIC COMPONENT

Japanese Patent JP2006055700

A

To provide a forming method for a silica based hardened coating film having a dielectric constant not higher than that of a conventional porous film and sufficiently excellent in mechanical strengths.

The forming method for the silica based hardened coating film has the first step for coating the silica based coating film formed on a substrate with a liquid containing a first catalyst; and the second step for hardening the silica based coating film after the first step to obtain the silica based hardened coating film.

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ABE KOICHI
SAKURAI HARUAKI

JP2004237642A

March 02, 2006

August 17, 2004

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HITACHI CHEMICAL CO LTD

B05D7/24; C09D7/12; C09D183/00; C09D185/04; H01L21/312; H01L21/316; C08G77/06

Yoshiki Hasegawa
Shiro Terasaki
Ryugo Akahori

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