To provide a method for forming a silica-based washability working film, where a part that is worked and exposed by selective etching treatment has washability by an acid solution.
The method for forming the silica-based washability working film comprises a paint film formation process for coating a substrate with a coating liquid for forming silica-based films for drying and forming the paint film, a first heat-treatment process for forming films by performing heat treatment on the paint film obtained by the paint film formation process, a selective etching treatment process for selectively performing etching treatment on the paint film, and a second heat-treatment process for further performing heat treatment on the paint film after the selective etching treatment for improving the degree of curing of a section exposed by the etching treatment.
SATO ISAO
SHIBUYA TATSUHIKO
