Title:
シリカ膜の形成方法
Document Type and Number:
Japanese Patent JP5069582
Kind Code:
B2
Inventors:
Toshio Teranaka
Koji Hanaoka
Takahiro Tanaka
Yamaguchi Masu Tsukasa
Toyohiko Shindo
Koji Hanaoka
Takahiro Tanaka
Yamaguchi Masu Tsukasa
Toyohiko Shindo
Application Number:
JP2008025491A
Publication Date:
November 07, 2012
Filing Date:
February 05, 2008
Export Citation:
Assignee:
Contamination Control Service Co., Ltd.
International Classes:
C01B33/12; (IPC1-7): B01J23/88; C10G45/04; C10G45/08
Domestic Patent References:
| JP7002511A | ||||
| JP2007046432A1 | ||||
| JP7135174A | ||||
| JP2007177328A | ||||
| JP10212114A | ||||
| JP63289939A |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama
Tadashi Takahashi
Takashi Watanabe
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama