Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD OF INACTIVATING SPENT SILICON POWDER
Document Type and Number:
Japanese Patent JPS63310690
Kind Code:
A
Abstract:
Residual silicone from direct process manufacture of chlorosilanes is stabilized for transportation and disposal.

More Like This:
JP2008505046Manufacturing method of crystalline silicon ingot
JP3181884Crystalline silicon ingots and silicon wafers manufactured from them
JP6472768Method for quantifying impurities in silicon crystals and method for selecting polycrystalline silicon by photoluminescence method
Inventors:
ARAN RITSUZAA
JIYOOJI PATON MARONII JIYUNIA
JIYATSUKU KAARU RUUNIGU
Application Number:
JP9849288A
Publication Date:
December 19, 1988
Filing Date:
April 22, 1988
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
GEN ELECTRIC
International Classes:
C01B33/02; C01B33/107; C07F7/12; B09B3/00; C08K11/00; (IPC1-7): B09B3/00; C01B33/02; C07F7/12
Attorney, Agent or Firm:
Tokunji Ikunuma



 
Previous Patent: STRUCTURE FOR INHIBITING TOXIC SUBSTANCE IN DUST DEPOSIT LEACHATE CONTAINING TOXIC SUBSTANCE HAVING ...

Next Patent: METHOD OF TREATING CONTAMINATED MINERAL SUBSTANCE