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Title:
METHOD FOR INSPECTING PATTERN
Document Type and Number:
Japanese Patent JP3316977
Kind Code:
B2
Abstract:

PURPOSE: To accurately inspect the defective state at a defective part in a defective article by using the length of the defective part as a criterion and using also the width of the defective part as a criterion.
CONSTITUTION: The width (w) of edge data in a defective part is found out from the edge data of a pattern to be measured and the length X of the defective part in the pattern to be measured is found out from the edge data in the defective part and the edge data of a master pattern. A value of X satisfying X>KW52 or X<KW57 is adopted as the criterion of the length X of the defective part and a value of y satisfying yW>w53 or (w)<zW55 is adopted as the criterion of the width (w) of the defective part in the pattern to be measured. The values (k), (y), (z) are initialized and the defective state of the defective part is judged by using the width (W) of the master pattern and the width (w) of the pattern to be measured as a criterion, so that even when the defective part is positionally deviated, the position is corrected and the defective state can be inspected. Thereby the state of a projection, thinning, thickening or notch or the like can be accurately defined.


Inventors:
Shuzo Matsuno
Application Number:
JP27901293A
Publication Date:
August 19, 2002
Filing Date:
October 12, 1993
Export Citation:
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Assignee:
Nippon Avionics Co., Ltd.
International Classes:
H01L21/66; G06T1/00; G06T7/00; G06T7/60; (IPC1-7): G06T7/00; G06T1/00; G06T7/60; H01L21/66
Domestic Patent References:
JP6273116A
JP4286085A
JP339603A
JP62299710A
Attorney, Agent or Firm:
Taeko