Title:
METHOD FOR INSPECTING SUBSTRATE WITH MULTILAYER REFLECTION FILM, AND METHOD FOR MANUFACTURING REFLECTIVE MASK BLANK
Document Type and Number:
Japanese Patent JP2022165217
Kind Code:
A
Abstract:
To provide a technique for highly accurately detecting coordinates of amplitude and phase defects within a short time.SOLUTION: An inspection method comprises the following steps (A)-(D). (A): imaging a substrate while moving the substrate at a first moving speed using a first defect inspection device, thereby detecting an amplitude defect present in the substrate, and acquiring coordinates of the amplitude defect in a first coordinate system, (B): imaging the substrate while moving the substrate at a second moving speed using a second defect inspection device different from the first defect inspection device, thereby detecting a phase defect present in the substrate, and acquiring coordinates of the phase defect in a second coordinate system, (C) carrying out coordinate conversion for converting the coordinates of the amplitude defect from the fist coordinate system to the second coordinate system, and (D) moving the substrate at a third moving speed using the second defect inspection device or imaging the coordinates of the amplitude and phase defects in the second coordinate system while moving or stopping it, thereby acquiring the coordinates of the amplitude and phase defects again.SELECTED DRAWING: Figure 8
Inventors:
KIKUCHI DAISUKE
ARAOKA MIKI
ARAOKA MIKI
Application Number:
JP2021070482A
Publication Date:
October 31, 2022
Filing Date:
April 19, 2021
Export Citation:
Assignee:
AGC INC
International Classes:
G03F1/84; G01B11/30; G01N21/956; G03F1/24
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito