Title:
METHOD AND INSTRUMENT FOR MEASURING IMPURITY CONCENTRATION IN SUBSTRATE
Document Type and Number:
Japanese Patent JP2003234388
Kind Code:
A
Abstract:
To provide a method of measuring impurity concentration in a substrate improved so that the three-dimensional distribution of impurity density can easily, inexpensively and nondistructively be measured by using a PL intensity measuring instrument capable of measuring an optional place inside of a substrate.
The substrate having a smooth surface is prepared. Laser beams are made to enter the substrate from the smooth surface. The light intensity of photoluminescence light emitted inside the substrate and detected at an upper part is obtained. The impurity concentration in the substrate is obtained from the light intensity of the photoluminescence light.
Inventors:
IKEDA AYAKO
Application Number:
JP2002033798A
Publication Date:
August 22, 2003
Filing Date:
February 12, 2002
Export Citation:
Assignee:
SUMITOMO ELECTRIC INDUSTRIES
International Classes:
G01N21/64; H01L21/66; (IPC1-7): H01L21/66; G01N21/64
Attorney, Agent or Firm:
Hisami Fukami (4 outside)