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Patent Searching and Data


Title:
METHOD FOR INTRODUCING SAMPLE FOR ICP EMISSION ANALYSIS
Document Type and Number:
Japanese Patent JPH01118752
Kind Code:
A
Abstract:
PURPOSE:To make analysis with good S/N possible by splashing the sample powder on a sample holder by the tip of filamentary plasma so that the powder is introduced into a plasma flame. CONSTITUTION:A central tube T1 of a plasma torch is a sample supply tube to which a carrier gas is sent. Gaseous plasma to form the plasma flame is supplied to an intermediate tube T2 and a cooling gas to a sleeve tube T3. Gaseous argon is supplied to the respective tubes T1-T3 of the plasma torch. The plasma flame P is ignited when high-frequency electric power is supplied to a high-frequency coil C and a high voltage to the sample holder B by a high-voltage generator H. The filamentous plasma F extends downward in the central tube T1 and arrives at the front end part of the sample holder B when said plasma flame P is formed. The sample powder is splashed at this moment and is entrained in the flow of the carrier gas. Even a slight amt. of the sample is introduced at one time into the plasma flame and, therefore, the analysis with the good S/N is enabled.

Inventors:
OKADA KOJI
MIZUKAMI HARUO
DAIHO KENSUKE
IMAMURA NAOKI
Application Number:
JP27622187A
Publication Date:
May 11, 1989
Filing Date:
October 31, 1987
Export Citation:
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Assignee:
SHIMADZU CORP
International Classes:
G01N21/73; (IPC1-7): G01N21/73
Attorney, Agent or Firm:
Kosuke Agata