Title:
METHOD FOR MAGNETICALLY ENHANCING PLASMA DENSITY
Document Type and Number:
Japanese Patent JPS63282282
Kind Code:
A
Abstract:
A magnetically enhanced plasma etch reactor utilizing electromagnets for rotation and translational scans of a linear magnetic field in a reaction chamber to produce a dense and uniform plasma for the etch of a workpiece.
Inventors:
IEFUIMU BATSUKUMAN
Application Number:
JP10003088A
Publication Date:
November 18, 1988
Filing Date:
April 22, 1988
Export Citation:
Assignee:
MOTOROLA INC
International Classes:
C23F4/00; H01J37/32; H05H1/10; (IPC1-7): C23F4/00; H05H1/10
Attorney, Agent or Firm:
Kugoro Tamamushi