To provide a method for manufacturing an antireflection film excellent in chemical resistance, adhesiveness and scratch resistance after moisture-heat treatment under conditions of high temperature and high humidity.

In the method for manufacturing an antireflection film by stacking a hard coat layer directly or over other layers on a film base material and further stacking a low refractive index layer on the hard coat layer, the hard coat layer contains at least one fluorine-siloxane grafted polymer, and after the hard coat layer is subjected to surface treatment, a low refractive index layer is stacked thereon, which contains at least one hollow silica-based particles having an outer shell layer and a porous or hollow inner part.