To provide a further efficient method of manufacturing phosphonium sulfonate antistatic agents (especially one step method), and to provide a thermoplastic resin composition into which these antistatic agents are mixed.
The method of manufacturing the phosphonium sulfonate salt of generic formula (1) includes: a step of mixing lithium or sodium salt of highly halogenated sulfonic acid in an aqueous medium with 4-substituted alkyl phosphonium cation compound of stoichiometric excessive amount; and a step of separating the product of formula (1) from the medium. In the formula, each X is independently halogen or hydrogen, provided that the molar ratio of halogen to hydrogen is greater than about 0.90; p is 0 or 1 and q and r are integers of 0 to about 7, provided that q+r is less than 8 and that if p is not 0, then r is greater than 0; and each R is the same or different hydrocarbon radical containing 1 to about 18 carbon atoms.
LEENDERS CHIEL ALBERTUS
VAN DE GRAMPEL ROBERT DIRK
| JP2007532647A | 2007-11-15 | |||
| JP2004292447A | 2004-10-21 | |||
| JP2004292447A | 2004-10-21 | |||
| JP2001122845A | 2001-05-08 | |||
| JP2007532647A | 2007-11-15 |
| US5051330A | 1991-09-24 |
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro
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