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Title:
METHOD FOR MANUFACTURING BLACK MATRIX SUBSTRATE
Document Type and Number:
Japanese Patent JP2011209747
Kind Code:
A
Abstract:

To provide a method for manufacturing a black matrix substrate that has a black matrix layer in which multiple attachment pattern is formed, the method being free from application failure when spin-applying a liquefied photosensitive resin composition in which pigment is dispersed.

In the method for manufacturing the black matrix substrate 10, in which the black matrix layer 12 is formed on a transparent substrate, the black matrix layer 12 is formed by multiple attachment which has a plurality of display parts. The pixel opening 13 of the black matrix layer 12 has a rectangular shape, substantially rectangular in shape, or polygonal shape other than a rectangular shape. The area Pa (μm2) and faceted interval Pd (μm) of the pixel opening 13 are found. A value Pa/Pd (μm) indicating the relation satisfies expression (1) given below. (1) 1.0 μm≤Pa/Pd.


Inventors:
KOMORI ATSUSHI
TAKANO MASAKAZU
ARAKI ERIKO
KANAYAMA NOBUAKI
Application Number:
JP2011126095A
Publication Date:
October 20, 2011
Filing Date:
June 06, 2011
Export Citation:
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Assignee:
DAINIPPON PRINTING CO LTD
International Classes:
G02B5/20; G02F1/1335
Domestic Patent References:
JP2004219733A2004-08-05
JP2004206059A2004-07-22
Attorney, Agent or Firm:
Satoshi Kanayama
Keiko Fukamachi
Hideo Ito
Hiromi Fujimasu
Naoki Goto
Yusuke Ito