Title:
METHOD OF MANUFACTURING COLOR FILTER SUBSTRATE AND METHOD OF MANUFACTURING ELECTRO-OPTICAL APPARATUS
Document Type and Number:
Japanese Patent JP2009075502
Kind Code:
A
Abstract:
To obtain a color filter having excellent color reproducibility by forming a uniform film thickness resist by performing exposure of a substrate from upper and lower sides.
The method has processes S2, S4 and S6 in which the color resist of a plurality of colors is formed on the substrate for the respective colors, and processes S3, S5 and S7 in which a patterning is performed by exposing the color resist of the respective colors, wherein the patterning process by exposing includes processes S11 and S12 in which the substrate is irradiated with exposure light from both the upper and lower sides for the color resist of at least one color among the plurality of colors.
Inventors:
USHIYAMA HIDETOSHI
MOCHIZUKI HIROAKI
MOCHIZUKI HIROAKI
Application Number:
JP2007246679A
Publication Date:
April 09, 2009
Filing Date:
September 25, 2007
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
G02B5/20; G02F1/1335
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Kazuhiko Miyasaka
Osamu Suzawa
Kazuhiko Miyasaka