Title:
METHOD FOR MANUFACTURING FERROELECTRIC THIN FILM TWO-DIMENSIONAL PHOTONIC CRYSTAL AND OPTICAL ELEMENT
Document Type and Number:
Japanese Patent JP2004239979
Kind Code:
A
Abstract:
To provide a method for manufacturing a ferroelectric thin film two-dimensional photonic crystal having good periodicity and good epitaxial crystallinity, and to provide an optical element using the two-dimensional photonic crystal.
The method for manufacturing the ferroelectric thin film two-dimensional photonic crystal constitutes mold by a substrate consisting of an oxide monocrystal and a two-dimensional periodical structure consisting of amorphous oxide or a semiconductor, forms an amorphous film by a chemical gas phase growth method at a lower temperature than a crystallization temperature, and forms a ferroelectric thin film having epitaxial crystallinity.
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Inventors:
NAMIKAWA TADAHIRO
Application Number:
JP2003026351A
Publication Date:
August 26, 2004
Filing Date:
February 03, 2003
Export Citation:
Assignee:
MURATA MANUFACTURING CO
International Classes:
G02B6/12; G02B1/02; G02B5/18; G02B6/13; G02F1/03; G02F1/035; (IPC1-7): G02B1/02; G02B5/18; G02B6/12; G02B6/13; G02F1/03; G02F1/035