Title:
METHOD FOR MANUFACTURING MICROELECTRONIC DEVICE COMPRISING MEMBRANE SUSPENDED ABOVE CAVITY
Document Type and Number:
Japanese Patent JP2022001403
Kind Code:
A
Abstract:
To provide a method for manufacturing a device which can adjust cavity dimension, and on the other hand, maintains membrane integrity, and comprising the membrane suspended above the cavity.SOLUTION: A method for manufacturing a microelectronic device comprising a membrane 20' suspended above at least one final cavity provides a support substrate 1 having at least one basic cavity 110, and a donor substrate. The method includes a step at which the support substrate and the donor substrate are assembled, and then, a step at which the donor substrate is thinned in a way that forms a membrane. The method further includes a step at which at least one mooring column 3 of the membrane is formed. The method includes a step at which a surface layer of the support substrate is etched in a way that expands at least one basic cavity in order to form the final cavity after forming at least one mooring column 3 and after assembling.SELECTED DRAWING: Figure 9A
Inventors:
MATHILDE CARTIER
BRUNO FAIN
BRUNO FAIN
Application Number:
JP2021100867A
Publication Date:
January 06, 2022
Filing Date:
June 17, 2021
Export Citation:
Assignee:
COMMISSARIAT ENERGIE ATOMIQUE
International Classes:
B81C1/00; B81C3/00; H01L21/02; H04R31/00
Attorney, Agent or Firm:
Yasuhiko Murayama
Shinya Mitsuhiro
Tatsuhiko Abe
Shinya Mitsuhiro
Tatsuhiko Abe
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