Title:
METHOD FOR MANUFACTURING MOLD FOR ANTIGLARE PROCESS
Document Type and Number:
Japanese Patent JP2014180768
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method for manufacturing a mold for an antiglare process, by which a high precision pattern can be transferred by exposure in a general-purpose apparatus configuration that can be easily handled.SOLUTION: The method for manufacturing a mold for an antiglare process includes: a photosensitive resin layer forming step of forming a photosensitive resin layer on a mold base material; an exposure step of exposing the photosensitive resin layer so as to project an image of a pattern on an exposure mask onto the surface of the photosensitive resin layer by using a projection exposure apparatus which holds the exposure mask having a reverse Fourier transform image preliminarily formed therein and which includes a light source and a projection optical system, and further moving an exposure position on the surface of the photosensitive resin layer so as to repeat the exposure in an area not subjected to the exposure; a developing step of developing the photosensitive resin layer to obtain the photosensitive resin layer with an opening pattern formed therein; and a first etching step of etching the surface of the mold base material by using the photosensitive resin layer with the opening pattern formed therein as a mask.
Inventors:
FUJII TAKASHI
FURUYA TSUTOMU
JINNO TORU
FURUYA TSUTOMU
JINNO TORU
Application Number:
JP2013054830A
Publication Date:
September 29, 2014
Filing Date:
March 18, 2013
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
B29C33/38; B29C33/42; G02B5/02; B29L11/00
Attorney, Agent or Firm:
Patent business corporation Fukami patent firm