Title:
METHOD FOR MANUFACTURING PATTERNED RETARDATION FILM
Document Type and Number:
Japanese Patent JP2014199321
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To efficiently manufacture a retardation film having a stripe pattern with high accuracy of each line width and a pitch between lines.SOLUTION: An alignment layer 24 is applied on a surface of a support body 2, a resin layer 30 is further applied thereon, and the support body is conveyed to a resin layer curing device 10. The resin layer curing device 10 includes first to fourth zones 10A to 10D within a cover 31, each zone provided with UV lamps 32a to 32d for photocuring the resin layer 30. Intensities of irradiation light from the UV lamps 32a to 32d are set to be graded. While the resin layer 30 with the support body 2 passes through the resin layer curing device 10, the resin layer 30 is cured and subjected to a temperature history by gradual heating. Thereby, polarization characteristics of a liquid crystal layer are stabilized and fluctuations in a line pattern are suppressed.
Inventors:
KATAGIRI TOSHIYUKI
NAKAO MASATO
NAKAO MASATO
Application Number:
JP2013074503A
Publication Date:
October 23, 2014
Filing Date:
March 29, 2013
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G02B5/30; B32B7/02; G02F1/1337
Attorney, Agent or Firm:
Kazunori Kobayashi