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Title:
METHOD FOR MANUFACTURING PHOTOMASK, THE PHOTOMASK, AND EXPOSING METHOD THEREOF
Document Type and Number:
Japanese Patent JP2005099655
Kind Code:
A
Abstract:

To provide a method for manufacturing a photomask with steps, a photomask which is greatly improved in size precision of an auxiliary pattern by coating even a substrate, obtained by forming a shifter-dug step part on a transparent substrate by etching, with photosensitive resin so that the surface is smooth and the film thickness is uniform, or a photomask with a Levenson type phase shift.

The method for manufacturing a photomask having a mask pattern formed of step parts of two or more kinds of height, includes, before a stage of forming at least one kind of step part in 2nd order or later, a stage of making the substrate surface smooth by coating the step parts formed in the previous stage with the photosensitive resin and then polishing the photosensitive resin.


Inventors:
SASAKI ATSUSHI
KONISHI TOSHIO
TAMURA AKIRA
CHIBA KAZUAKI
MORITA MOTOHIKO
OTAKI MASAO
Application Number:
JP2003387573A
Publication Date:
April 14, 2005
Filing Date:
November 18, 2003
Export Citation:
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Assignee:
TOPPAN PRINTING CO LTD
International Classes:
G03F1/32; G03F1/36; G03F1/54; G03F1/68; G03F7/40; H01L21/027; (IPC1-7): G03F1/08; H01L21/027
Domestic Patent References:
JPH08250397A1996-09-27
JP2003115434A2003-04-18
JPH04116918A1992-04-17
JPH06289593A1994-10-18
JP2000206667A2000-07-28
JPH03289127A1991-12-19



 
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