Title:
液浸露光用フォトレジスト用高分子化合物の製造法
Document Type and Number:
Japanese Patent JP4744113
Kind Code:
B2
Inventors:
Takashi Arai
Application Number:
JP2004255497A
Publication Date:
August 10, 2011
Filing Date:
September 02, 2004
Export Citation:
Assignee:
Daicel Chemical Industry Co., Ltd.
International Classes:
C08F6/00; C08F20/18; C08F20/28; C08F32/00; G03F7/033; G03F7/039; H01L21/027
Domestic Patent References:
| JP2003342319A | ||||
| JP2005126459A |
Foreign References:
| WO2003082933A1 |
Attorney, Agent or Firm:
Yukihisa Goto