Title:
高分子化合物の製造方法及びレジスト材料
Document Type and Number:
Japanese Patent JP4088784
Kind Code:
B2
Abstract:
A polymer comprising hydroxystyrene units and tert-alkoxycarbonylstyrene units is prepared by polymerizing an acetal group-blocked hydroxystyrene monomer and a tert-alkoxycarbonylstyrene monomer to form a preliminary polymer, and subjecting the preliminary polymer to selective deblocking reaction of acetal groups in the presence of an acid catalyst. The polymer thus produced has a narrower molecular weight distribution. A resist composition comprising the polymer as a base resin has advantages including a dissolution contrast of resist film, high resolution, exposure latitude, process flexibility, good pattern profile after exposure, and minimized line edge roughness.
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Inventors:
Takanobu Takeda
Osamu Watanabe
Jun Hatakeyama
Wataru Kusagi
Osamu Watanabe
Jun Hatakeyama
Wataru Kusagi
Application Number:
JP2003174951A
Publication Date:
May 21, 2008
Filing Date:
June 19, 2003
Export Citation:
Assignee:
Shin-Etsu Chemical Co., Ltd.
International Classes:
C08F8/12; G03F7/033; C08F8/00; G03F7/039; H01L21/027
Domestic Patent References:
| JP7181679A | ||||
| JP6289608A | ||||
| JP2003107707A | ||||
| JP2002348328A | ||||
| JP11269230A |
Attorney, Agent or Firm:
Takashi Kojima
Saori Shigematsu
Katsunari Kobayashi
Saori Shigematsu
Katsunari Kobayashi