Title:
RESIN, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
Document Type and Number:
Japanese Patent JP2021191855
Kind Code:
A
Abstract:
To provide a resin capable of producing a resist pattern with good CD uniformity (CDU) and a resist composition containing the resin.SOLUTION: A resist pattern can be produced with good CD uniformity by the resin which has a structural unit containing a group represented by formula (aa1) and the like. [In the formula (aa1), Xa and Xb each independently represent an oxygen atom or a sulfur atom; W1 and W2 each independently represent an optionally substituted C3-36 alicyclic hydrocarbon group or the like; and * represents a bond.]SELECTED DRAWING: None
Inventors:
MASUYAMA TATSURO
OKADA NATSUKI
ICHIKAWA KOJI
OKADA NATSUKI
ICHIKAWA KOJI
Application Number:
JP2021130641A
Publication Date:
December 16, 2021
Filing Date:
August 10, 2021
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
C08F220/26; C08K5/42; C08L33/14; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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