Title:
レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6900276
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt that makes it possible to produce a resist pattern with good CD uniformity (CDU), a resist composition containing the same, and a method for producing a resist pattern.SOLUTION: A salt represented by formula (I), a resist composition containing the same, and a method for producing a resist pattern are provided. [In the formula, Qand Qeach independently represent a fluorine atom or a perfluoroalkyl group; Rand Reach independently represent a hydrogen atom, a fluorine atom, or a perfluoroalkyl group; z represents an integer of 0-6; Xrepresents *-CO-O-, *-O-CO-, *-O-CO-O-, or *-O-; * represents a bonding position to C(R)(R) or C(Q)(Q); Arepresents a linear or branched divalent saturated aliphatic hydrocarbon group; Rand Reach independently represent a fluorinated alkyl group; and Zrepresents an organic cation.]SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2017160418A
Publication Date:
July 07, 2021
Filing Date:
August 23, 2017
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; C07C309/17; C07C381/12; C07D307/32; C07D307/93; C07D317/72; C07D319/08; C07D321/10; C07D327/06; C07D327/08; C07D333/46; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2007145822A |
Foreign References:
| WO2013111667A1 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation