Title:
レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7041527
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern with excellent resolution, and a method for producing a resist pattern.SOLUTION: The resist composition contains a salt represented by formula (I0) and a compound having a partial structure represented by formula (IIa). [In the formulae, Qand Qeach represent F or a perfluoroalkyl group; Rand Reach represent H, F or a perfluoroalkyl group; z represents an integer of 0-6; Xrepresents *-C(=O)-O-, *-O-C(=O)- or the like; Arepresents a single bond, an alicyclic hydrocarbon group or the like; Aand Aeach represent a single bond, an aliphatic hydrocarbon group or the like; Ar represents an aromatic hydrocarbon group or the like; Xrepresents a single bond or a divalent hydrocarbon group which may have F; Zrepresents an organic cation; R, Rand Reach represent a single bond, a hydrocarbon group or the like; s represents an integer of 1 or more; and * represents a bonding position.]SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Yamaguchi Norifumi
Koji Ichikawa
Yamaguchi Norifumi
Koji Ichikawa
Application Number:
JP2018005561A
Publication Date:
March 24, 2022
Filing Date:
January 17, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; C08F30/08; C09K3/00; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014010183A | ||||
| JP2013053137A | ||||
| JP2013068778A | ||||
| JP62040450A | ||||
| JP2010106236A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation
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