Title:
レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7085872
Kind Code:
B2
Abstract:
To provide a resin and a resist composition capable of producing a resist pattern with good line edge roughness (LER).SOLUTION: Provided is a resin containing a structural unit represented by formula (I) and a structural unit represented by formula (a1-0), formula (a1-1) or formula (a1-2). [In the formulae, R, R, R, Rand Rare specific group or alkyl groups; Lis a single bond or an alkanediyl group; Lis an alkanediyl group; Ar is a divalent aromatic hydrocarbon group; L, Land Lare each independently -O- or-O-(CH)-CO-O-; k1 is an integer of 1-7; * is a bond with -CO-; R, R, R, Rand Rare specific groups; and m1, n1 and n1' are specific integers.]SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2018062577A
Publication Date:
June 17, 2022
Filing Date:
March 28, 2018
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/039; C08F220/18; G03F7/004; G03F7/20
Domestic Patent References:
| JP2013029564A | ||||
| JP2007279699A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation