Title:
レジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6935255
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing a resist pattern, capable of producing a resist pattern with excellent line edge roughness.SOLUTION: The method for producing a resist pattern includes: applying a resist composition containing a salt represented by formula (I) and a resin containing a structural unit having an acid-labile group onto a substrate; drying the composition to form a composition layer; subjecting the composition layer to immersion exposure; heating the composition layer; and developing the composition layer with a negative developer. [In the formula, Arand Areach represent an aromatic hydrocarbon group or a heteroaromatic hydrocarbon group; Xand Xeach represent an alkanediyl group; Rrepresents a hydrocarbon group; Qand Qeach represent a fluorine atom or a perfluoroalkyl group; Lrepresents a saturated hydrocarbon group; and Y represents an optionally substituted methyl group or a monovalent alicyclic hydrocarbon group.]SELECTED DRAWING: None
Inventors:
Yukako Adachi
Masahiko Shimada
Koji Ichikawa
Masahiko Shimada
Koji Ichikawa
Application Number:
JP2017135950A
Publication Date:
September 15, 2021
Filing Date:
July 12, 2017
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
G03F7/004; C07C381/12; C07D321/10; G03F7/038; G03F7/039; G03F7/20; G03F7/30
Domestic Patent References:
| JP2008056668A |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation