Title:
METHOD OF MANUFACTURING SEMICONDUCTOR SINGLE-CRYSTAL WAFER
Document Type and Number:
Japanese Patent JP2011009590
Kind Code:
A
Abstract:
To provide a method of manufacturing a semiconductor single-crystal wafer, which reduces shape defects such as dispersion of thickness and warpage, in a semiconductor single-crystal wafer.
This method of manufacturing a semiconductor single-crystal wafer is used for slicing a semiconductor single-crystal ingot by a wire saw. In the method of manufacturing a semiconductor single-crystal wafer, an auxiliary tool formed of ceramics or a resin is attached to the semiconductor single-crystal ingot, and the slicing is started from the auxiliary tool.
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Inventors:
UEMATSU EI
Application Number:
JP2009153163A
Publication Date:
January 13, 2011
Filing Date:
June 29, 2009
Export Citation:
Assignee:
HITACHI CABLE
International Classes:
H01L21/304; B24B27/06; B28D5/04; B28D7/04
Attorney, Agent or Firm:
Polaire Patent Business Corporation
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