Title:
METHOD FOR MANUFACTURING SILICON NITRIDE FILTER
Document Type and Number:
Japanese Patent JP2007308313
Kind Code:
A
Abstract:
To provide a method for manufacturing a silicon nitride filter being highly air-permeable, excellent in the catching and removing efficiency of particulates and suitable as a DPF.
The silicon nitride filter where metal silicon is substantially converted to silicon nitride is manufactured by heat-treating a formed body containing metal silicon particles and a pore forming material in nitrogen. In the whole mass of the pore forming material, the content of approximately spherical particles having an average particle diameter of 10-30 μm is 10-50 mass% and approximately spherical particles having an average particle diameter of 40-100 μm is 90-50 mass%.
COPYRIGHT: (C)2008,JPO&INPIT
Inventors:
HAYASHI ICHIRO
WATANABE TOSHINARI
WATANABE TOSHINARI
Application Number:
JP2006136619A
Publication Date:
November 29, 2007
Filing Date:
May 16, 2006
Export Citation:
Assignee:
ASAHI GLASS CO LTD
International Classes:
C04B38/06; B01D39/00; B01D39/20; C04B35/591
Previous Patent: MULTIPLE-FUEL COMBUSTOR
Next Patent: MANUFACTURING PROCESS OF POLYCRYSTALLINE SILICON
Next Patent: MANUFACTURING PROCESS OF POLYCRYSTALLINE SILICON