Title:
METHOD FOR PRODUCING SUBSTRATE WITH PATTERNED FILM AND FLUORINE-CONTAINING COPOLYMER
Document Type and Number:
Japanese Patent JP2023178312
Kind Code:
A
Abstract:
To provide a method for producing a substrate with a patterned film.SOLUTION: A production method for a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film, which includes a substrate with a patterned film on the substrate, with the patterned film including a fluorine-containing copolymer with a specific repeat unit, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.SELECTED DRAWING: None
Inventors:
KANEKO YUZURU
AOKI TAKASHI
NOMURA YUSUKE
SASAKI YOSHIKO
SANO ASUKA
AOKI TAKASHI
NOMURA YUSUKE
SASAKI YOSHIKO
SANO ASUKA
Application Number:
JP2023166327A
Publication Date:
December 14, 2023
Filing Date:
September 27, 2023
Export Citation:
Assignee:
CENTRAL GLASS CO LTD
International Classes:
G03F7/40; C08F220/22; C08F236/16; G03F7/033; H10K59/122; H10K71/20; H10K71/40; H10K77/10; H10K85/10
Attorney, Agent or Firm:
Patent Attorney Firm WisePlus