Title:
METHOD FOR MANUFACTURING TRANSPARENT THIN FILM
Document Type and Number:
Japanese Patent JP2002371355
Kind Code:
A
Abstract:
To provide a method for manufacturing a transparent thin film having high transmittance in a short wavelength region of visible rays, by sputtering.
The method for manufacturing the transparent thin film with sputtering is characterized by performing sputtering so as to make the content of sputtering-gas-composing atoms in the thin film to be 0.05 atom.% or less.
Inventors:
NAKAMURA TOSHITAKA
SASA KAZUAKI
UEDA ZENICHI
HIEDA YOSHIHIRO
MIYAUCHI KAZUHIKO
AZUMI YUKIKO
SASA KAZUAKI
UEDA ZENICHI
HIEDA YOSHIHIRO
MIYAUCHI KAZUHIKO
AZUMI YUKIKO
Application Number:
JP2001180787A
Publication Date:
December 26, 2002
Filing Date:
June 14, 2001
Export Citation:
Assignee:
NITTO DENKO CORP
International Classes:
G02B5/28; B32B7/02; C23C14/08; C23C14/34; G02B1/10; G02B1/113; H01B5/14; H01B13/00; (IPC1-7): C23C14/34; B32B7/02; C23C14/08; G02B1/10; G02B5/28; H01B5/14; H01B13/00
Attorney, Agent or Firm:
Ogi
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