Title:
METHOD OF MEASURING TEMPERATURE OF SUBSTRATE, AND SUBSTRATE HEAT TREATMENT APPARATUS AND METHOD OF CORRECTING SETTING TEMPERATURE THEREIN
Document Type and Number:
Japanese Patent JP3833162
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To measure the temperature of a substrate accurately even at high temperatures.
SOLUTION: A thermometer element S formed by connecting a quartz oscillator 9 and a coil 10 is set in a dummy substrate 4. In a non-contact state with the dummy substrate 4, a transmission wave having a frequency corresponding to a characteristic frequency of the quartz oscillator 9 is transmitted to the thermometer element S. Meanwhile, a sensor coil 11 for receiving electromagnetic waves from the thermometer element S, a switch 12, and a transmitter 13 and a receiver 14 are equipped. After stopping the transmission of the transmission wave, an electromagnetic wave in accordance with the temperature of the dummy substrate which is emitted from damped oscillation of the quartz oscillator 9 after resonance is received, and the temperature of the dummy substrate 4 is measured based on the frequency of the electromagnetic wave from the thermometer element S.
Inventors:
Kenji Kamei
Application Number:
JP2002303075A
Publication Date:
October 11, 2006
Filing Date:
October 17, 2002
Export Citation:
Assignee:
Dainippon Screen Mfg. Co., Ltd.
International Classes:
H01L21/66; H01L21/02; H01L21/027; (IPC1-7): H01L21/66; H01L21/02; H01L21/027
Domestic Patent References:
| JP63282625A | ||||
| JP2002168699A |
Attorney, Agent or Firm:
Tsutomu Sugiya
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