Title:
Si-H官能性シロキサンオリゴマーの調製方法
Document Type and Number:
Japanese Patent JP2008538763
Kind Code:
A
Abstract:
The present invention relates to a method of making a Si-H functional siloxane oligomer from the reaction between silicon hydride compounds and cyclic siloxane oligomer in the presence of a Lewis acid that is capable of interacting with the hydrogen of the silicon hydride to promote ring opening of the cyclic siloxane oligomer and the insertion a siloxane oligomer segment between Si and H atom to thereby form the Si-H functional siloxane oligomer.
Inventors:
Rubinstein Sulawomile
Fortuniak Vitort
Hoynovski Julian
Kuryata Yang
Fortuniak Vitort
Hoynovski Julian
Kuryata Yang
Application Number:
JP2008507717A
Publication Date:
November 06, 2008
Filing Date:
April 12, 2006
Export Citation:
Assignee:
Momentive Performance Materials, Inc.
International Classes:
C07F7/08; C08G77/12; C08L83/05; C07B61/00
Domestic Patent References:
| JPH11217390A | 1999-08-10 | |||
| JPH10114826A | 1998-05-06 | |||
| JPH08208839A | 1996-08-13 |
Foreign References:
| US20040127668A1 | 2004-07-01 |
Other References:
JPN6012006381; Ｚｅｉｔｓｃｈｒｉｆｔ ｆｕｅｒ Ａｎｏｒｇａｎｉｓｃｈｅ Ｃｈｅｍｉｅ Ｖｏｌ．５４３, ｐ．２１９-２３２ （１９８６）．
Attorney, Agent or Firm:
Kazuko Fujita