Title:
METHOD FOR PRODUCING ACETIC ACID AND FORMIC ACID FROM CARBON DIOXIDE AND AQUEOUS SOLUTION
Document Type and Number:
Japanese Patent JP2022027365
Kind Code:
A
Abstract:
To provide a method for producing acetic acid and formic acid from carbon dioxide by using the photocatalytic reaction of tungsten oxide semiconductor fine particles, and a plant for production of acetic acid and formic acid.SOLUTION: The present invention discloses a method for producing acetic acid and formic acid from carbon dioxide by using sun rays or artificial light without requiring oxygen for its degradation. The present invention also discloses a plant for production of acetic acid and formic acid that has a photocatalyst substrate, in which a sol primer containing a mixture of an organic solution primer with a dye, ethyl viologen dichloride, Acetobacter enzyme, and tungsten oxide semiconductor fine particles is applied onto a substrate to be dried and fixed.SELECTED DRAWING: Figure 1
Inventors:
YAMAGUCHI YOSHINOBU
Application Number:
JP2020140460A
Publication Date:
February 10, 2022
Filing Date:
July 31, 2020
Export Citation:
Assignee:
YAMAGUCHI YOSHINOBU
YAMAGUCHI MICHIKO
YAMAGUCHI MICHIKO
International Classes:
C12P7/54; B01J31/02; B01J35/02; B01J37/04; C07C51/00; C07C53/02; C07C53/08; C12P7/40