Title:
保護層形成用組成物の製造方法、保護層形成用組成物の保存方法およびこの保存方法の応用
Document Type and Number:
Japanese Patent JP7149418
Kind Code:
B2
Abstract:
Provided is a method for producing a composition for forming a protective layer, the composition being layered on an organic layer and being used in forming a water-soluble protective layer for protecting the organic layer from liquid chemicals, and the method being such that: after a composition including a water-soluble resin and a solvent has been stirred, the method includes continuously exposing a container into which the stirred composition was charged to an environment in a temperature range of 0-18°C for 24 hours or longer; and the start time of the period of exposure to the aforementioned environment is within 72 hours after completion of stirring. Also provided are a method for preserving a composition for forming a protective layer, and a practical application of the preservation method.
Inventors:
Hideki Takakuwa
Kazuto Shimada
Yuichiro Enomoto
Kazuto Shimada
Yuichiro Enomoto
Application Number:
JP2021526966A
Publication Date:
October 06, 2022
Filing Date:
June 22, 2020
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
H01L21/312; C08K5/00; C08L1/00; C08L29/04; C08L39/06; C08L101/14; G03F7/11
Domestic Patent References:
| JP2014187249A | ||||
| JP7068683A | ||||
| JP5011405A | ||||
| JP2018513811A |
Foreign References:
| WO2016175220A1 | ||||
| US20080044635 | ||||
| CN105348552A |
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes
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